Adisyn Ltd (ASX:AI1) Successfully Commissions New ALD System

Operational Achievements

Adisyn Ltd has successfully installed, tested, and commissioned its new Beneq TFS 200 Atomic Layer Deposition (ALD) system at its state-of-the-art research facility. The ALD system, secured by its subsidiary 2D Generation, enables advanced graphene research and development.

Facility Upgrades

Major infrastructure upgrades were completed to support the ALD system, including environmental control systems and high-specification electrical works. These upgrades enhance process parameters, precision control, speed, and throughput compared to legacy systems.

Future Outlook

With the new ALD system and the one at Tel Aviv University operational, Adisyn will begin validating technical results and advancing its low-temperature graphene deposition process for semiconductor interconnects. An update on the development roadmap is expected in Q1 FY26.

Executive Comments

Chairman Kevin Crofton said, “Commissioning this new ALD system represents a major operational leap for Adisyn. The precision, flexibility, and throughput of this platform enables us to rigorously test our graphene interconnect solution under real-world semiconductor conditions. Used in parallel with the ALD system at Tel Aviv University, we now have a powerful dual-platform setup to accelerate development, validate performance, and build a strong foundation for commercial application.”

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